EUV Pod OLUS with N2 Purge

Comply with EUV (Extreme Ultraviolet) Reticle Pod in advanced process. N2 Purge for reticle pod quality control also keeps the mask in good condition while transferring by an automatic transfer system. 2-port design, both ports can be configured as input or out ports.

製品特徴

製品の寸法: L-135 W-57 H-190 cm
製品の重さ: 90 KG
標準仕様: Mass Flow Control, E84 Communication, 11.7" full-color touch panel, 4-colors signal tower
FOUP認識システム: RFID, Barcode

製品特徴

1. Configurable for input or output port

2. Barcode or RFID FOUP ID identified system

3. Mass flow control (MFC) on purging air

4. Anti-statistic Silicone material nozzles, the hydrophobic coating creates a barrier against dirt. Repel dust, and particles, and easier to clean

5. Support E84 communication protocol

6. Equips with an 11.7" full-color touch panel with a user-friendly interface

7. Real-time status display, automatically produces charts of flow for the User to understand the status by timeline

製品寸法図

製品特徴

製品の寸法: L-135 W-57 H-190 cm
製品の重さ: 90 KG
標準仕様: Mass Flow Control, E84 Communication, 11.7" full-color touch panel, 4-colors signal tower
FOUP認識システム: RFID, Barcode