EUV Pod OLUS with N2 Purge

Comply with EUV (Extreme Ultraviolet) Reticle Pod in advanced process. N2 Purge for reticle pod quality control also keeps the mask in good condition while transferring by an automatic transfer system. 2-port design, both ports can be configured as input or out ports.

Product Specification

Dimension: L-135 W-57 H-190 cm
Weight: 90 KG
Standard Specification: Mass Flow Control, E84 Communication, 11.7" full-color touch panel, 4-colors signal tower
ID system option: RFID, Barcode

Product Highlight

1. Configurable for input or output port

2. Barcode or RFID FOUP ID identified system

3. Mass flow control (MFC) on purging air

4. Anti-statistic Silicone material nozzles, the hydrophobic coating creates a barrier against dirt. Repel dust, and particles, and easier to clean

5. Support E84 communication protocol

6. Equips with an 11.7" full-color touch panel with a user-friendly interface

7. Real-time status display, automatically produces charts of flow for the User to understand the status by timeline

Photo Description

Product Specification

Dimension: L-135 W-57 H-190 cm
Weight: 90 KG
Standard Specification: Mass Flow Control, E84 Communication, 11.7" full-color touch panel, 4-colors signal tower
ID system option: RFID, Barcode